| 摘要: |
| 通过对那西肽产生菌N106的孢子进行紫外诱变处理（15 W，253.7 nm，距离30 cm），再利用链霉素抗性突变作为筛选模型（链霉素最低抑制浓度为3 u/mL）获得了链霉素抗性基因突变的高产菌株NUS146和NUS182，摇瓶发酵水平分别达到3233和3452 u/mL，比出发菌株N106的摇瓶水平2502 u/mL分别提高了29.22%和37.97%。传代试验表明，该两突变株遗传特性相对稳定。 |
| 关键词: 链霉素抗性 诱变育种 那西肽 稳定 |
| DOI： |
| 投稿时间：2012-02-09修订日期：2012-03-05 |
| 基金项目: |
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| Breeding of High-producing Nosiheptide Strain by Streptomycin Resistance Mutation |
| Zizhao Gao |
| (Zhejiang Cifu Pharmaceuticals Co.,Ltd.) |
| Abstract: |
| The spores of nosiheptide producing strain N106 were mutated with UV light (15W, 253.7 nm, Distance of 30 cm), and the streptomycin (its minimum lethal dose was 3 u/mL) resistance mutation was used as the screen model to obtain the streptomycin-resistant mutant. Consequently two high-producing strains of NUS146 and NUS182 were got. Compared the activity of shaking flask fermentation, the high-yield strains could reach 3233 and 3452 u/mL which increased by 29.22% and 37.97% respectively, while the strain N106 was only 2502 u/mL. The generation test results showed that the genetic characters of two mutants were relatively stable. |
| Key words: streptomycin resistance mutation breeding nosiheptide stable |
